Photoresist stripper chemicals

Rinse the board in cold water to clean off the developer stop bath , the parts that are to be etched should look like competely clean copper, no residue. Contact lithography offers high resolution down to about the wavelength of the radiation , but practical problems such as mask damage and resulting low yield make this process unusable in most production environments.


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Making good registered double sided PCBs Using the Modela or any other mini-mill to do all the through-holes before etching Laminating dry-film photoresist onto copper-clad boards Plated through-hole vias requires more chemistry and another machine.



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There are some traces of unetched copper on the right. Open Innovation Fujifilm's open innovation is about listening to the customer and innovating together.

Semiconductor Lithography (Photolithography) - The Basic Process

Development is undoubtedly one of the most critical steps in the photoresist process. You can move the holder up and down to make sure the board is sprayed off.

Typical prebake processes leave between 3 and 8 percent residual solvent in the resist film, sufficiently small to keep the film stable during subsequent lithographic processing. Next, tape down the design on two edges, so that the tape does not overlap any of the layout, but holds the paper flat. Figure shows a generic photoresist spin coat cycle.
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  1. Bruno will work closely with Technic teams in regional technical service, new product development, and manufacturing engineering. This step takes 3 minutes.

  2. Turn on the wash spray again, moving the holder around so that the entire board and holder are completely cleaned off. The carboxylic acid product is very soluble in the basic developer.